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科学研究

Advanced manufacturing of photoelectric film

2018/09/28 14:29
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[Abstract]:
Research goal: continuously improve the theoretical level of optical film and functional film, improve the film preparation process, and open up new test methods. In the country to achieve the purpose

Research goal: continuously improve the theoretical level of optical film and functional film, improve the film preparation process, and open up new test methods. In the country to achieve the purpose of leading the development of the discipline to meet the national strategic needs.

The main research directions are as follows:

l Thin film optical theory and film formation technology research

Based on the theory of electromagnetic field, the theory of photonic crystal and the theory of subwavelength are used to develop and perfect the theory of thin film optics. The research of thin film deposition technology is carried out by means of PVD and CVD, and the physical processes of film formation in different processes are studied on a micro scale. Various tests and other methods to accurately characterize and study the properties of the film to achieve a breakthrough in the understanding of the film formation mechanism.

2 Super large size mirror coating equipment and process

In view of the characteristics of large-size mirrors, explore new coating methods, solve the problem of surface modification of SiC mirrors and high-reflection film plating, lead the development of domestic super-large vacuum coating equipment manufacturing, research and development of supporting technology, for China's foundation and day The oversized mirror coating for the base application provides solid technical support.

3 New silicon-based near-infrared detector photoelectric materials research

Through the research on the preparation process, doping concentration, doping particle type and surface metal nanoparticle deposition of black silicon material, the structure and characteristics of black silicon material are deeply explored, and the key technical problems in the application of photodetector parts are overcome.

4 Radar and infrared stealth functional material design and preparation technology research

Through the design and inversion of macroscopic constitutive parameters of radar stealth metamaterials, integrated design of ensemble active controllable stealth materials and feed networks, accurate positioning of curved laser etching and precise removal of materials, multi-dimensional composite infrared Research on analysis design and process preparation technology of stealth materials, breaking through the limitations of traditional radar stealth materials performance and manufacturing bottlenecks, developing active stealth material technology with adjustable frequency, establishing complete design, manufacturing and testing conditions to ensure the formation of multi-function radar The ability to develop stealth materials, to achieve a variety of models to meet the country's major strategic needs; to use infrared stealth technology as a starting point, to explore new mechanisms and methods of infrared stealth materials, innovative infrared stealth materials preparation process, infrared stealth technology for weapons and equipment Provide new ideas and new technologies. On this basis, the research work will be further extended to the field of visible light stealth technology, opening up a new direction for the advanced optical technology field.

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